Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
Reynolds Tech Wet Bench - Caustic Develop (USYD)
Wet Bench for caustic development processes
NSW
NSW
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Description
Exhausted wet bench used for handling of caustic based chemicals – primarily TMAH based developers
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Related Information
Includes automated spin process unit for development of wafers up to 7 inches squared.
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Tool Owner
Reynolds Tech Wet Bench (USYD)
Wet Bench for general purpose caustic etch processes
NSW
NSW
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Description
Exhausted wet bench used for handling of general purpose caustic based chemicals
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Related Information
Includes integrated stirring hotplate, heated and filtered process tank and cascading tank for batch processing
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Tool Owner
Reynolds Tech Wet Bench -Solvent Develop (USYD)
Wet bench for solvent based development processes
NSW
NSW
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Description
Exhausted wet bench used for solvent based development processes
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Related Information
Includes cold plate for cold development processes
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Tool Owner
Reynolds Tech Hotplate Tower (USYD)
Stacked Hotplate tower
NSW
NSW
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Description
Exhausted stacked hotplates for baking during solvent based processes
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Related Information
Includes 4 hotplates dedicated to different temperature ranges – used for baking/outgassing purposes
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Tool Owner
Class One Wetbench & spin dryer (UQ)
Wetbench with spin dryer
QLD
QLD
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Description
The wetbench has three baths for chemical etching and one dump rinse station.
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Related Information
The system is primarily setup for KOH etching of silicon. The baths can be heated. In this setup batch processing can be performed.
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Tool Owner
Amerimade Automated Wetbench Suite (MCN)
Set of wet benches for wet processing
VIC
VIC
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Description
The automated wet-bench suite is comprised of three custom made instruments – a manual wet processing deck, a semi-automated chemical cleaning station and an IPA aerosol vapour dryer. All three wetbench instruments are designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. The wetbench suite significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management systems.
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Related Information
Manual wet processing baths – KOH, Cr etcher, 5% H2SO4, IPA and DI water. Semi-automated chemical cleaning station (enclosed, exhausted) baths – piranha, SC-2, buffered oxide etch (BOE), DI water and ultrasonic acetone de-scum station. The IPA aerosol vapour dryer dries without any need for heaters or rotation. Substrate size – Up to 6 “. Batch processing – Up to 25 wafers.
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Tool Owner
