Stepper
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Stepper

A stepper is a highly accurate photolithography system that enables a pattern to be repeated on a wafer many times.The traditional photolithography process creates a pattern on a substrate by shining light from a light source onto a photoresist that coats the surface of the substrate through a photomask and is followed by a development phase. In a stepper, the substrate is placed on a moveable stage so that the pattern can be to be projected onto the resist-coated substrate, redirected, and the pattern repeated. This is very useful when trying to create many of the same component on a single wafer.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
ASML PAS 5500/100
i-line Stepper
NSW Node University of Sydney
Description
A high throughput step-and-repeat projection lithography system that can pattern feature sizes down to 350 nm
Related Information
Well suited to demonstrating scalable batch processes on 6" wafers at low - medium volume production. Accepts 6" reticles with 5x reduction in critical dimensions. Die size limited to 22 x 22mm.
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
ASML PAS 5500/100
i-line Stepper
NSW Node University of Sydney
Description
A high throughput step-and-repeat projection lithography system that can pattern feature sizes down to 350 nm
Related Information
Well suited to demonstrating scalable batch processes on 6" wafers at low - medium volume production. Accepts 6" reticles with 5x reduction in critical dimensions. Die size limited to 22 x 22mm.
Tool Contact
rpf.queries@sydney.edu.au