Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
AJA International ATC-2400 V (ANU)
Sputtering system
ACT
ACT
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Description
Magnetron sputter system with three DC sources and three RF sources
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Related Information
A large choice of materials available.
Provides reactive sputtering and co-sputtering.
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Tool Owner
Emitech K550 (USYD)
Sputter Coater
NSW
NSW
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Description
Small throw sputter coater for coating of small samples
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Related Information
2 inch sputter targets of Au, Ag and Ti available.
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Tool Owner
HHV TF600 (UNSW)
Sputtering system
NSW
NSW
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Description
More information to come
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Related Information
More information to come
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Tool Owner
AJA International ATC-2200 (UQ)
RF/DC sputtering system
QLD
QLD
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Description
The system has RF and DC sputter sources in addition to Argon, Oxygen and Nitrogen gases for reactive film deposition.
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Related Information
Vacuum Load lock.
Argon, nitrogen and oxygen gases available.
Substrate heater to 350°C.
Wafer size up to 8 inch and wafer holder can be rotated.
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Tool Owner
HHV TF500 (UniSA)
Sputtering system
SA
SA
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Description
A 3 magnetron sputtering system for the deposition of high quality (pinhole free) metal layers.
Able to accommodate up to 6 inch diameter substrates. Fitted with three sputter sources with a switching system to select from DC or RF power supplies. Multilayer deposition can be performed without breaking vacuum.
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Related Information
Commonly used for the fabrication of UV lithography and DRI etch masks. Can deposit metals including Au, Cr, Mo, Ti, TiO2, ITO
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Tool Owner
Intlvac Nanochrome (MCN)
AC/DC Sputtering system with co-deposition
VIC
VIC
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Description
An automated tool which can be used to deposit a wide variety of conductive thin films including metals, oxides, nitrides and alloys.
The system allows for up to three materials to be co-deposited at once, with the option to vary the composition over time.
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Related Information
Can coat with three materials in the same run.
Features ion beam cleaning.
Recipe-based automated operation.
Can be used to coat samples of up to 8 inches in diameter.
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Tool Owner
Anatech Hummer BC-20 (MCN)
RF/DC sputtering system
VIC
VIC
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Description
Manual tool which can be used to deposit a wide variety of conductive and non-conductive thin films including metals, oxides, nitrides and alloys.
The system allows for up to two materials to be co-deposited at once, with the option to vary the composition over time.
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Related Information
Can coat with two materials in the same run.
Features ion beam cleaning.
Manual operation.
Can be used to coat samples of up to 6 inches in diameter.
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Tool Owner
4Wave The Laboratory Alloy and Nanolayer System (LANS) (UWA)
Biased target ion beam deposition system
WA
WA
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Description
Provides atomically engineered thin films and interfaces.
The tool can vary process pressures, adatom energies, and provides good uniformity and repeatability.
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Related Information
Typical deposited materials: Fe, Pd, Ce, Nb, Ga, Al, Si, and certain other materials upon request.
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Tool Owner
