Plasma etching

Etching > Dry Etching

Description

Plasma etching uses a finely controlled plasma to selectively remove material from a substrate.

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List of Available Tools

Tool Make and Model

Key Differentiator

Node

South Bay RIE3000 (USYD)

O2 Plasma Asher/RIE

NSW

NSW

  • Description
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  • Tool Owner
  • Description

    Reactive ion etch system dedicated to O2 and Ar plasma processes

  • Related Information

    Used primarily for resist and sample cleaning.

  • Tool Owner

LAM Autoetch 480 (Griffith)

Plasma Asher

QLD

QLD

  • Description
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  • Tool Owner
  • Description

    Plasma etching of 6 inch wafers using a semi-isotropic dry etch process.

    Can produce features of 3µm.

  • Related Information

    Utilises SF6 and O. Used to etch SiC, SiN and SiO2 and polymer resists.

  • Tool Owner

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