Capabilities

Plasma etching

Etching > Dry Etching

Description

Plasma etching uses a finely controlled plasma to selectively remove material from a substrate.

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List of Available Tools

Tool Make and Model

Key Differentiator

Node

South Bay RIE3000 (USYD)

O2 Plasma Asher/RIE

NSW

Description
Related Information
Tool Owner

Description

Reactive ion etch system dedicated to O2 and Ar plasma processes
Related Information

Used primarily for resist and sample cleaning.
Tool Owner

Gloria Qiu

LAM Autoetch 480 (Griffith)

Plasma Asher

QLD

Description
Related Information
Tool Owner

Description

Plasma etching of 6 inch wafers using a semi-isotropic dry etch process.

Can produce features of 3µm.
Related Information

Utilises SF6 and O. Used to etch SiC, SiN and SiO2 and polymer resists.
Tool Owner

Alan Iacopi @ Griffith

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