Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
EVG 620 (ANU)
UV lithography and NIL exposure
ACT
ACT
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Description
Standard optical lithography and Nano-Imprint UV Lithography
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Related Information
Process pieces up to 6 inch wafer with 1 micron resolution. Offers top-side alignment.
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Tool Owner
EVG 620 (MCN)
Mask aligner and resist exposure system with NIL capability
VIC
VIC
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Description
A high-resolution mask aligner with split-field microscopes that is capable of handling multiple wafer sizes with quick change-over time.
Features back side alignment capability for mask aligning.
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Related Information
Used for a variety of applications to transfer multiple layers of nanoscale patterns into photoresist films.
Provides a minimum feature size of approximately 1 µm.
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Tool Owner