Nano Imprint Lithography

Lithography > Photolithography

Description

Nanoimprint lithography uses a transparent mould to deform a layer of photoresist into a desired topography. Light is then passed through the clear mould to cure the resist and make these deformations permanent. This technique relies on the accuracy of the mould but can be used to create many identical...

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List of Available Tools

Tool Make and Model

Key Differentiator

Node

EVG 620 (ANU)

UV lithography and NIL exposure

ACT

ACT

  • Description
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  • Description

    Standard optical lithography and Nano-Imprint UV Lithography

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    Process pieces up to 6 inch wafer with 1 micron resolution. Offers top-side alignment.

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EVG 620 (MCN)

Mask aligner and resist exposure system with NIL capability

VIC

VIC

  • Description
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  • Description

    A high-resolution mask aligner with split-field microscopes that is capable of handling multiple wafer sizes with quick change-over time.

    Features back side alignment capability for mask aligning.

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    Used for a variety of applications to transfer multiple layers of nanoscale patterns into photoresist films.

    Provides a minimum feature size of approximately 1 µm.

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