Microwave Plasma-enhanced Chemical Vapour Deposition (MPCVD)

Deposition > Chemical Vapour Deposition (CVD)

Description

MPCVD is a chemical vapour deposition process which uses a continuous microwave source to create and help to maintain a highly reactive plasma made up of the reacting chemicals and necessary catalysts.

MPCVD is heavily used in the ANFF network to deposit layers of diamond – methane and hydrogen are...

Key Applications

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List of Available Tools

Tool Make and Model

Key Differentiator

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Seki AX6300 (MQ)

MPCVD system for deposition of diamond

Optofab

Optofab

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  • Description

    CVD reactor for growing polydiamond films from methane/hydrogen chemistries.

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    2 inch sample stage

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Seki AX6300 (MCN)

MPCVD system for deposition of boron-doped diamond

VIC

VIC

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    Used to coat seeded samples of any shape with boron-doped diamond.

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    Deposits at approximately 1 µm/h.

    Maximum sample size is 2 inches.

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Seki SDS 5010-INT (UTS)

MPCVD system for deposition of doped diamond

Optofab

Optofab

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  • Description

    The SEKI diamond CVD, located in the Vacuum lab facility, utilises a microwave plasma to assist the chemical vapour deposition of diamond, This growth of diamond can be doped to incorporate optically active colourcentres, such as the group IV colourcentres. The SEKI operates by initially generating a dense hydrogen plasma, which can also be employed to hydrogen terminate samples without deposition of diamond. This capability can therefore be used to activate a range of materials in pursuit of a range of project roles, both diamond and surface termination focused.

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    Possible doped films include Nitrogen, Boron, Germanium, Nickel etc.

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