Microwave Plasma-enhanced Chemical Vapour Deposition (MPCVD)

Deposition > Chemical Vapour Deposition (CVD)

Description

MPCVD is a chemical vapour deposition process which uses a continuous microwave source to create and help to maintain a highly reactive plasma made up of the reacting chemicals and necessary catalysts.

MPCVD is heavily used in the ANFF network to deposit layers of diamond – methane and hydrogen are...

Key Applications

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List of Available Tools

Tool Make and Model

Key Differentiator

Node

Seki AX6300 (MQ)

MPCVD system for deposition of diamond

Optofab

Optofab

  • Description
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  • Tool Owner
  • Description

    CVD reactor for growing polydiamond films from methane/hydrogen chemistries.

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    2 inch sample stage

  • Tool Owner

Seki AX6300 (MCN)

MPCVD system for deposition of boron-doped diamond

VIC

VIC

  • Description
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  • Description

    Used to coat seeded samples of any shape with boron-doped diamond.

  • Related Information

    Deposits at approximately 1 µm/h.

    Maximum sample size is 2 inches.

  • Tool Owner

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