Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
Barrell Melt extrusion pot (UoW)
Polymer melting pot
Materials Node
Materials Node
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Description
Pneumatic melt pot extruder
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Related Information
250g max
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Tool Owner
Custom Glass melter (UoA)
Controlled atmosphere oxide glass melting facilities.
Optofab
Optofab
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Description
Facility consisting of a 6-port glovebox with integrated furnaces
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Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces.
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Tool Owner
Hitech CTF/150/3Z/1200C (UQ)
Oxidation Furnace
QLD
QLD
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Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
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Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.
Sample size of up to 6″ wafers.
Up to 25 wafers per run.
Maximum temperature of 1200°C.
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Tool Owner
Hitech CTF/150/3Z/1200C (MCN)
Wet/dry oxidation furnace
VIC
VIC
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Description
Allows for the wet or dry oxidation of up to 25 wafers in one run. SiO2 growth up to 4µm possible via wet oxidation.
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Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.
Sample size of up to 6″ wafers.
Up to 25 wafers per run.
Maximum temperature of 1200°C.
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Tool Owner
LABEC 1500 (UTS)
Ceramic tube furnace for 1,500° exposure
Optofab
Optofab
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Description
Two tube furnaces are available at UTS optohub, The Labec 1500, and the STF1200, both found in the Vacuum lab facilities. The labec 1500 is a ceramic furnace, capable of achieving temperatures up to 1500 degrees, above what is generally achievable by quartz based furnaces, allowing for annealing and CVD at higher temperatures over sustained periods in vacuum controlled environments.
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Related Information
Temperature range scaling up to 1500C, vacuum compatible, access to inert gas lines including nitrogen/argon environment. Rate of rise of 5C/minute. Ceramic tubes required for high tempreature experiments
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Tool Owner
STF 1200 (UTS)
Tube furnace for HBN Overgrowth
Optofab
Optofab
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Description
Two tube furnaces are available at UTS optohub, The Labec 1500, and the STF1200, both found in the Vacuum lab facilities.
The STF 1200 is a purpose built Tube furnace setup for the generation of optically active hBN samples. Samples of this product are available, however this tube furnace is reserved for hBN growth exclusively. Samples available upon request. -
Related Information
Temperature range scaling up to 1200C, vacuum compatible, access to inert gas lines including nitrogen/argon environment. Priority access to hBN growth
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Tool Owner
