Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
FEI Helios NanoLab 600 Dual Beam SEM/FIB (ANU)
Scanning electron microscope with focused ion beam for milling (FIB-SEM)
ACT
ACT
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Description
A multifunction system for nanofabrication, characterisation, and high-resolution imaging
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Related Information
Offers high-resolution imaging, milling, patterning, EDS, EBSD and EBIC
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Tool Owner
FEI Helios NanoLab 600 Dual Beam (MCN)
Scanning electron microscope with focused ion beam for milling (FIB-SEM)
VIC
VIC
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Description
Ultra-high resolution three dimensional imaging for topography, surface morphology and maskless ion beam direct lithography.
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Related Information
Ultra-high resolution imaging of samples of all sizes up to 6-inch wafers.
The 5-axis stage and 100mm stage movement add flexibility to this equipment.
Choice of Secondary Electrons (SE) detector best for topography images and Back-Scattered Electrons (BSE) detector for studies of features deep beneath the surface.
Ion beam patterning with 30 kV accelerating voltage and variable currents.
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Tool Owner