Electron Beam Evaporation (E-Beam Evaporation)

Deposition > Physical Vapour Deposition (PVD)

Description

Electron-beam evaporation is a physical vapour deposition method for depositing thin films of metals, oxides and semiconductors in a high vacuum environment. Ultra high purity coating material is placed inside a vacuum chamber, typically as pellets in a crucible. Electron energy is used to heat these...

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List of Available Tools

Tool Make and Model

Key Differentiator

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Temescal BJD2000 (ANU)

Electron beam evaporator for depositing metals including Au, Pt, Ti, Al, Cr, Ge, Ni, Mo, Nb

ACT

ACT

  • Description
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  • Description

    Equipment provides E-beam evaporation of metals and also features a thermal evaporation source for gold.

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    Features an electron gun and up to six crucibles.

    Materials: Au, Pt, Ag, Ti, Cr, Al, Ge, Ni, Mo

  • Tool Owner

Temescal Systems FC-2000 (UQ)

Electron beam evaporator

QLD

QLD

  • Description
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  • Description

    Can perform thermal and e-beam evaporation on multiple wafers at the same time. Features six source pockets for multiple layer coatings.

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    Available evaporation materials are: Al, Ni, Cr, Ag, Au, Ti, Cu, NiO, TiO2, MoO3, Al2O3 and ITO alongside 2 reactive  gases.

    Features a Load Lock.

    Can hold up to 13 x 4 inch wafers.

    Substrate heater up to 300°C.

    E-gun power is 10kV

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Intlvac Nanochrome II (MCN)

Electron beam evaporator

VIC

VIC

  • Description
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  • Description

    Single films or multi-material stacks are easily created using simple layer definitions.

    Features ion-beam pre-cleaning and sample heating capabilities.

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    Features a 10kV power supply and supports up to sixteen 4 inch wafers or fifteen 6 inch wafers or wafer mounted samples.

    Coating thickness are from 2nm up to 200nm (thickness >200nm by approval).

    Currently available in the materials library are metals (Al, Cr, Ti, Au, Ag), oxides (SiO2, TiO2, Al2O3, ITO), fluorides (MgF2) and semiconductors (Si, Ge).

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Edwards Auto 500 (UWA)

Electron beam evaporator

WA

WA

  • Description
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  • Description

    Ability to deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. The tool allows thick film deposition and also multiple coatings.

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    Materials: Au, Ti, Ge, Pt, Ni, Al, and certain other materials upon request.

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Scientific Vacuum Systems V6000 (UWA)

Electron beam evaporator

WA

WA

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  • Description

    Confocal sputtering systems for creating research mirrors. Featuring the same quality of design and components the V6000 research coaters are ideal for single wafer processing.

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    Up to 6-inch diameter confocal sputter magnetron target options. Materials: Ti, Au, and certain other materials upon request.

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