Electron Beam Evaporation (E-Beam Evaporation)
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Electron Beam Evaporation (E-Beam Evaporation)

Electron-beam evaporation is a physical vapour deposition method for depositing thin films of metals, oxides and semiconductors in a high vacuum environment. Ultra high purity coating material is placed inside a vacuum chamber, typically as pellets in a crucible. Electron energy is used to heat these pellets, causing the coating material to enter the gas phase. Due to the vacuum environment, the evaporated particles can travel to the substrate without colliding with foreign particles, where they then condense on the substrate surface in a thin film.Electron beam evaporation is used to deposit electronic and optical films for the semiconductor industry and has applications in displays and photovoltaics. High melting point materials can be deposited at high deposition rates, making this a preferred process for refractory metal and ceramic films.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Edwards Auto 500
Electron beam evaporator
University of Western Australia WA Node
Description
Ability to deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. The tool allows thick film deposition and also multiple coatings.
Related Information
Materials: Au, Ti, Ge, Pt, Ni, Al, and certain other materials upon request.
Tool Contact
anff-wa@uwa.edu.au
Intlvac Nanochrome II
Electron beam evaporator
Melbourne Centre for Nanofabrication VIC Node
Description
Single films or multi-material stacks are easily created using simple layer definitions. Features ion-beam pre-cleaning and sample heating capabilities.
Related Information
Features a 10kV power supply and supports up to sixteen 4 inch wafers or fifteen 6 inch wafers or wafer mounted samples.Coating thickness are from 2nm up to 200nm (thickness >200nm by approval). Currently available in the materials library are metals (Al, Cr, Ti, Au, Ag), oxides (SiO2, TiO2, Al2O3, ITO), fluorides (MgF2) and semiconductors (Si, Ge).
Tool Contact
mcn-enquiries@nanomelbourne.com
Scientific Vacuum Systems V6000
Electron beam evaporator
University of Western Australia WA Node
Description
Confocal sputtering systems for creating research mirrors. Featuring the same quality of design and components the V6000 research coaters are ideal for single wafer processing.
Related Information
Up to 6-inch diameter confocal sputter magnetron target options. Materials: Ti, Au, and certain other materials upon request.
Tool Contact
anff-wa@uwa.edu.au
Temescal BJD2000
Electron beam evaporator for depositing metals including Au, Pt, Ti, Al, Cr, Ge, Ni, Mo, Nb
ACT Node Australian National University (ANU)
Description
Equipment provides E-beam evaporation of metals and also features a thermal evaporation source for gold.
Related Information
Features an electron gun and up to six crucibles. Materials: Au, Pt, Ag, Ti, Cr, Al, Ge, Ni, Mo
Tool Contact
horst.punzmann@anu.edu.au
Temescal Systems FC-2000
Electron beam evaporator
QLD Node University of Queensland
Description
Can perform thermal and e-beam evaporation on multiple wafers at the same time. Features six source pockets for multiple layer coatings.
Related Information
Available evaporation materials are: Al, Ni, Cr, Ag, Au, Ti, Cu, NiO, TiO2, MoO3, Al2O3 and ITO alongside 2 reactive gases. Features a Load Lock. Can hold up to 13 x 4 inch wafers. Substrate heater up to 300°C. E-gun power is 10kV
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Edwards Auto 500
Electron beam evaporator
QLD Node University of Queensland
Description
Ability to deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. The tool allows thick film deposition and also multiple coatings.
Related Information
Materials: Au, Ti, Ge, Pt, Ni, Al, and certain other materials upon request.
Tool Contact
anff-wa@uwa.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Intlvac Nanochrome II
Electron beam evaporator
QLD Node University of Queensland
Description
Single films or multi-material stacks are easily created using simple layer definitions. Features ion-beam pre-cleaning and sample heating capabilities.
Related Information
Features a 10kV power supply and supports up to sixteen 4 inch wafers or fifteen 6 inch wafers or wafer mounted samples.Coating thickness are from 2nm up to 200nm (thickness >200nm by approval). Currently available in the materials library are metals (Al, Cr, Ti, Au, Ag), oxides (SiO2, TiO2, Al2O3, ITO), fluorides (MgF2) and semiconductors (Si, Ge).
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Scientific Vacuum Systems V6000
Electron beam evaporator
QLD Node University of Queensland
Description
Confocal sputtering systems for creating research mirrors. Featuring the same quality of design and components the V6000 research coaters are ideal for single wafer processing.
Related Information
Up to 6-inch diameter confocal sputter magnetron target options. Materials: Ti, Au, and certain other materials upon request.
Tool Contact
anff-wa@uwa.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Temescal BJD2000
Electron beam evaporator for depositing metals including Au, Pt, Ti, Al, Cr, Ge, Ni, Mo, Nb
QLD Node University of Queensland
Description
Equipment provides E-beam evaporation of metals and also features a thermal evaporation source for gold.
Related Information
Features an electron gun and up to six crucibles. Materials: Au, Pt, Ag, Ti, Cr, Al, Ge, Ni, Mo
Tool Contact
horst.punzmann@anu.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Temescal Systems FC-2000
Electron beam evaporator
QLD Node University of Queensland
Description
Can perform thermal and e-beam evaporation on multiple wafers at the same time. Features six source pockets for multiple layer coatings.
Related Information
Available evaporation materials are: Al, Ni, Cr, Ag, Au, Ti, Cu, NiO, TiO2, MoO3, Al2O3 and ITO alongside 2 reactive gases. Features a Load Lock. Can hold up to 13 x 4 inch wafers. Substrate heater up to 300°C. E-gun power is 10kV
Tool Contact
anff@uq.edu.au

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