Displacement Talbot Lithography (DTL)

Lithography > Photolithography


Displacement Talbot Lithography (DTL) uses specialised photomasks to pattern entire wafers at resolutions beyond the diffractive limit of light.

It provides low-cost fabrication of periodic nanostructures, and is perfect as complimentary tool to EBL to produce repeating patterns with sub-micron feature...

Contact Us

List of Available Tools

Tool Make and Model

Key Differentiator


EULITHA PhableR 100 (MCN)

Sub-micron photolithography



  • Description
  • Related Information
  • Tool Owner
  • Description

    The PhableR is a proprietary Displacement Talbot Lithography (DTL) capability from EULITHA.

    MCN’s PhableR is the only open access DTL capability in Australia, novel photomasks are used to create repeating patterns at resolutions beyond the diffraction limit.

  • Related Information

    MCN’s PhableR provides non-contact sub-micron patterning with exposure uniformity better than 3% for 6 inch wafers.

    • Manual wafer and mask load
    • Frontside overlay alignment
    • Overlay alignment with manual actuators
    • Configurable for thin/thick substrates
  • Tool Owner

Get Enlightened by ANFF

ANFF now offers nanofabrication training online. Click the button below to visit our learning resource, ANFF Enlightened, and gain the fab knowledge required to take your R&D further.

Visit ANFF Enlightened