Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
EULITHA PhableR 100 (MCN)
Sub-micron photolithography
VIC
VIC
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Description
The PhableR is a proprietary Displacement Talbot Lithography (DTL) capability from EULITHA.
MCN’s PhableR is the only open access DTL capability in Australia, novel photomasks are used to create repeating patterns at resolutions beyond the diffraction limit.
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Related Information
MCN’s PhableR provides non-contact sub-micron patterning with exposure uniformity better than 3% for 6 inch wafers.
- Manual wafer and mask load
- Frontside overlay alignment
- Overlay alignment with manual actuators
- Configurable for thin/thick substrates
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Tool Owner