Displacement Talbot Lithography (DTL) uses specialised photomasks to pattern entire wafers at resolutions beyond the diffractive limit of light.

It provides low-cost fabrication of periodic nanostructures, and is perfect as complimentary tool to EBL to produce repeating patterns with sub-micron feature sizes, such as linear gratings and 2D arrays (hexagonal and square lattices)

Typical applications include: LED and nanowire LED production, LCD displays, solar cells, Antireflection layers and color filters, Nanoparticle production, and biosensors.