Direct Laser Writing (DLW)

Lithography > Direct Write Lithography

Description

Direct Laser Writing (DLW) is a process used to directly transfer a design pattern into a photo sensitive polymer coated onto a substrate such as glass or silicon. The focused laser light (generally 370 or 405nm) is used to modify the polymer to make the material more soluble during development or to...

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List of Available Tools

Tool Make and Model

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Heidelberg DWL 66+ (USYD)

Direct laser lithography system

NSW

NSW

  • Description
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  • Tool Owner
  • Description

    Direct write laser lithography system capable of high resolution and grayscale patterning

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    375 nm laser wavelength, multiple write modes.

    Capable of achieving sub 500 nm features with highest resolution, alignment, maximum write area 200 x 200 mm

  • Tool Owner

Heidelberg µPG 101 (UQ)

Direct laser lithography system on a 6 inch platform.

QLD

QLD

  • Description
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  • Description

    Direct writing of structures down to 1µm in photoresist coated substrates and writing of chrome masks.

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    Writes into 405nm sensitive photoresist (not SU8) or onto a Chrome mask blank.

    The substrate is scanned under a fixed laser that exposes a blue (405nm) laser which is split into 8 pixels.

    The design is loaded in GDS2 format which controls the stage movement and pixel exposure.

  • Tool Owner

Dilase 650 (UniSA)

Direct laser lithography system

SA

SA

  • Description
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  • Tool Owner
  • Description

    This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.

  • Related Information

    Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.

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