Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
Heidelberg DWL 66+ (USYD)
Direct laser lithography system
NSW
NSW
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Description
Direct write laser lithography system capable of high resolution and grayscale patterning
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Related Information
375 nm laser wavelength, multiple write modes.
Capable of achieving sub 500 nm features with highest resolution, alignment, maximum write area 200 x 200 mm
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Tool Owner
Heidelberg µPG 101 (UQ)
Direct laser lithography system on a 6 inch platform.
QLD
QLD
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Description
Direct writing of structures down to 1µm in photoresist coated substrates and writing of chrome masks.
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Related Information
Writes into 405nm sensitive photoresist (not SU8) or onto a Chrome mask blank.
The substrate is scanned under a fixed laser that exposes a blue (405nm) laser which is split into 8 pixels.
The design is loaded in GDS2 format which controls the stage movement and pixel exposure.
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Tool Owner
Dilase 650 (UniSA)
Direct laser lithography system
SA
SA
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Description
This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.
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Related Information
Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.
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Tool Owner
