Capabilities
List of Available Tools
Tool Make and Model
Key Differentiator
Node
Tepla Gigabatch 300 (ANU)
Plasma asher
ACT
ACT
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Description
Used to strip resist and clean samples.
Useful during the fabrication of photovoltaic, optoelectronic or nano-photonic technologies as a vital part of the complete lithography process.
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Related Information
Available gases include O2 and CF4. The system is suitable to remove organic/polymers but also dielectrics including SiOx
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Tool Owner
OEM Spin Rinse Dryer - Etch (USYD)
Wafer Cleaning tool
NSW
NSW
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Description
Automated batch wafer cleaning tool
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Related Information
Can accommodate up to 6 inch round wafers
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Tool Owner
OEM Spin Rinse Dryer (USYD)
Wafer Cleaning tool
NSW
NSW
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Description
Automated batch wafer cleaning tool
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Related Information
Can accommodate up to 6 inch square wafers
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Tool Owner
Denton Asher (UNSW)
Plasma asher
NSW
NSW
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Description
More information to come
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Related Information
More information to come
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Tool Owner
Custom Asher (UNSW)
Plasma asher
NSW
NSW
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Description
More information to come
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Related Information
More information to come
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Tool Owner
Harrick Plasma PDC-001 & PDC-002 (UQ)
Plasma asher
QLD
QLD
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Description
Surface cleaning, sterilisation, activation, energy alteration, and preparation for bonding and adhesion (such as PDMS device fabrication); surface treatment of polymers and biomaterials through activation, grafting and surface coating; modification of surface chemistry
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Related Information
Materials used include silicon, glass, PDMS.
Sample size up to o a 4 inch wafer.
Oxygen plasma with power of 10 -30 w. Used to activate glass and PDMS surfaces before bonding as part of a soft lithography process.
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Tool Owner
Harrick Plasma PDC-002 (UQ)
Plasma cleaner
QLD
QLD
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Description
For nanoscale surface cleaning and surface activation. Used when making a glass-PDMS or PDMS-PDMS microfluidic chip
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Related Information
Provides an organic material etch rate of 5-10 nm/min
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Tool Owner
PlasmaTech V50 (UniSA)
Plasma asher
SA
SA
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Description
Used primarily for ashing photoresist materials from substrates.
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Related Information
Used in the fabrication of microfluidic devices. The system can be also used be used for various other surface treatments.
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Tool Owner
