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Inductively coupled plasma chemical vapour deposition ICPCVD

Inductively coupled plasma chemical vapour deposition ICP CVD

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of Western Australia
Purpose: Isolation/masking/structural
Material systems: SiN/ SiO/ poly-Si
Node: Western Australia
Scale/volume: up to 2 inch wafers
Specifications/resolution: Si/NH3/N2O/N2/O2/CF4