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Plasma asher

The PlasmaTech V50 plasma asher is used primarily for ashing photoresist materials from substrates used in the fabrication of microfluidic devices.

This process is done under vacuum in order to create a plasma. The system can be also used be used for other surface treatments

Fabrication step: Micro and nano fabrication
Function: Microfluidics & etching
Location: University of South Australia
Purpose: To clean substrates prior to fabrication steps throught the use of an activated palsma
Material systems: Any
Node: South Australia
Scale/volume: 6 inch diameter wafers