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Mask aligner with nano imprint lithography

The EVG 620 Mask Aligner with UV-NIL (nano-imprint lithography) capability is a high resolution double side mask aligner with splitfield microscopes and it is capable of handling multiple wafer sizes with quick change-over time. Menu driven software ensures repeatability over a number of different processes including aligned top and bottom features in substrates for the same device.

Fabrication step: Micro and nano fabrication
Function: Microfluidics & lithography
Location: University of South Australia
Purpose: To transfer multilayer patterns into photoresist films down to nanometer scale
Material systems: Ceramic, glasses, metal, polymers and semiconductor
Node: South Australia
Scale/volume: 6 inch diameter wafers