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Kloe Dilase 650 Laser Direct Write system

This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. It allows the writing on any type of substrate (photomasks, semiconductors, glass, polymers, crystals, flexible films...) over a surface area as large as 6x6 inches.

Fabrication step: micro and nano fabrication
Function: Lithography
Location: University of South Australia
Purpose: For direct write rapid prototyping and mask fabrication
Material systems: Non Material Specific
Node: South Australia