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XeF2 etcher

XeF2 Etcher

Fabrication step: Micro and nano fabrication
Function: Etching
Location: University of Queensland
Purpose: Used to isotropic etch silicon with long undercuts. Useful for membrane, MEMS and cantilever manufacture.
Material systems: Silicon and silicon dioxide on polymers
Node: Queensland
Scale/volume: up 150mm, (6inch) wafers or substrate
Specifications/resolution: Custom made system with stainless unit. Base pressure of 10 mTorr, 1 cubic meter control valves, JVC video camera & Navistar microscope with 1000x zoom and 3cm working distance with light box and fiber bundle