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OAI collimated light source system

Our model 30, OAI collimated UV light source system is highly efficient NUV exposure machine with a Mercury arch lamp. The system may be utilized in a variety of applications were alignment structures are not critical in photolithography.

Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane, producing highly collimated and highly uniform beams in the near UV (NUV; 360-440 nm) spectrum. The beam size is restricted to 4 inch wafers.

The shutter timer with freestanding exposure systems, activates the light source shutter. The timer range is from 0.1 to 999 seconds. OAI collimated light source systems can be used in a variety of applications, such as: MEMS processes, semiconductor photolithography, biotechnology and microfluidics.

Fabrication step: Micro and nano fabrication
Function: Lithography
Location: University of Queensland
Node: Queensland