MIVA 1624E T3 photoplotter

The MIVA 1624E T3 photoplotter is a flatbed type, allowing exposure of film, glass or chrome plates and eliminating any deformation of the medium during plotting.

The film is fixed in place during the plotting procedure and the area of the plot is exposed by a projector mounted on a moving X-Y axis table which moves in a plane parallel to the film. This configuration eliminates the need for dynamic focusing of the projected picture and any projected pixel size. The line width or structure size thereby, is stable over the plotting area.

The MIVA 1624E T3 is a compact class plotter and it is the smallest both in terms of machine size and plot size. The maximum plot area is 22 inch x 16 inches (550mm x 410mm). Available resolutions are selectable between 3000dpi and 24000dpi allowing a minimum structure size of 20 microns.

Example of Use:

• The MIVA photoplotter will be used to “print” high-resolution photomasks for further photolithography of patterned masters with which to mold microfluidic and bioreactor devices via soft-lithography. The photomasks may contain features as small as 10 micrometers. The key benefit of the MIVA is the ability to print on flexible films, which are cost-effective and can be produced very quickly. With this ability, we can produce prototype patterns for immediate device fabrication and testing. Prior to acquisition of the MIVA, patterns were outsourced for chrome mask production. Although chrome masks have even higher resolution (sub micrometer), they are extremely costly, and have a very long lead time, demanding a “first-time right” design approach.