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HiTech benchtop oxidation furnace

The HiTech benchtop oxidation furnace is a very user-friendly system with an auto loading/unloading feature. It is used for wet/dry oxidation in the annealing process.

It has a maximum temperature of 1200ºC.

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of Queensland
Purpose: Used to deposit oxide layers on wafers to 1200 degrees Celsius
Material systems: Silicon only
Node: Queensland
Scale/volume: Multi wafers to a maximum of 25
Specifications/resolution: Temperature range up to 1200 degrees C and it can process dry and wet oxidation.