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Reactive Ion Etcher RIE

Reactive Ion Etcher RIE

Fabrication step: Micro and nano fabrication
Function: Etching
Location: University of Sydney
Purpose: Dry etching basic gasses for silicon and silica processing (key photonic chip materials)
Material systems: Many but to be set up initially primarily for silica and silicon
Node: OptoFab
Scale/volume: Small scale for research devices
Specifications/resolution: "Basic no frills system as essential part of facility workflow.Gasses: SF6 CHF3 Ar O maybe Cl"