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i line stepper

I line stepper

Fabrication step: Micro and nano fabrication
Function: Lithography
Location: University of Sydney
Purpose: Large field size waferscale deep submicron resolution nm scale accuracy optical lithography
Material systems: VLSI; solar and structured coatings; nano fluidics; photonic crystals
Node: OptoFab
Scale/volume: Large volume possible. Scale depends on demag: cm to 10s of cm
Specifications/resolution: 2nd hand ASML: x4 193nm for ~100nm