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High resolution head for DWL

High resolution head for DWL

Fabrication step: Micro and nano fabrication
Function: Lithography
Location: University of Sydney
Purpose: Direct laser write to ~400nm
Material systems: Many mainly resists on masks but also direct write
Node: OptoFab
Scale/volume: Same as existing DWL
Specifications/resolution: Heidelberg. Improves resolution to ~400nm