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Vacutec reactive ion etching system

Vacutec reactive ion etching system

Fabrication step: Micro and nano fabrication
Function: Etching
Location: University of New South Wales
Purpose: etching of a range of materials
Material systems: Most substrates
Node: New South Wales
Scale/volume: Single wafer
Specifications/resolution: gases available: O2, SF6, CF4, Ar, SiH4, PH5, BH3, GeH4 , PH3, CH4, B2H6