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Vacutec Plasma Enhanced Chemical Vapour Deposition System

Vacutec Plasma Enhanced Chemical Vapour Deposition System

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of New South Wales
Purpose: deposition of amorphous Si or Si3N4
Material systems: Most substrates
Node: New South Wales
Scale/volume: Single wafer
Specifications/resolution: depositing amorphous Si or Si3N4; gases available: Ar, O2, SF6, CHF3