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Suite of resist processing tools (spinners and hotplates)

Suite of resist processing tools (spinners and hotplates)

Fabrication step: Micro and nano fabrication
Function: Clean rooms and associated equipment
Location: University of New South Wales
Purpose: UV lithography
Material systems: Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire)
Node: New South Wales
Scale/volume: Single wafer up to 150mm diameter
Specifications/resolution: spin up to 10,000rpm; bake up to 300C