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Oxidation Furnace - General Purpose

Oxidation Furnace (General Purpose)

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of New South Wales
Purpose: growth of thick oxides
Material systems: Silicon ONLY
Node: New South Wales
Scale/volume: Multiple (up to 20) wafers up to 100mm diameter
Specifications/resolution: 800-1100C; gases: O2, N2; wet (+H2O) or dry oxide growth; oxides up to 2 microns thick