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Oxidation Furnace - Dry Oxidation

Oxidation Furnace (Dry Oxidation)

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of New South Wales
Purpose: growth of ultra high quality thin oxides
Material systems: Silicon ONLY
Node: New South Wales
Scale/volume: Multiple (up to 20) wafers up to 100mm diameter
Specifications/resolution: 800-1000C; gases: UHP O2 (+DCE), UHP N2; high quality thin oxides