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Lesker PVD75 e-beam evaporator - MOS

Lesker PVD75 e-beam evaporator - MOS

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of New South Wales
Purpose: directional deposition of MOS-compatible metals
Material systems: Si MOS compatible materials only
Node: New South Wales
Scale/volume: Single wafer up to 150mm diameter
Specifications/resolution: Si-MOS compatible materials only; in-situ Ar plasma etching capability