Capability directory

Types of fabrication

Function

Location

Or use capability keyword(s)

Karl Suss MA6/BA6 mask aligner

Karl Suss MA6/BA6 mask aligner

Fabrication step: Micro and nano fabrication
Function: Lithography
Location: University of New South Wales
Purpose: UV lithography
Material systems: Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire)
Node: New South Wales
Scale/volume: Single wafer up to 150mm diameter
Specifications/resolution: sub-1micron resolution; back-side alignment capability