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Karl Suss MA6/BA6 mask aligner

Karl Suss MA6/BA6 mask aligner

Fabrication step: Micro and nano fabrication
Function: Lithography
Location: University of New South Wales
Purpose: UV lithography
Material systems: Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire)
Node: New South Wales
Scale/volume: Single wafer up to 150mm diameter
Specifications/resolution: sub-1micron resolution; back-side alignment capability