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Jipelec rapid thermal annealing furnace

Jipelec rapid thermal annealing furnace

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of New South Wales
Purpose: rapid thermal annealing (Si only)
Material systems: Si MOS compatible materials only
Node: New South Wales
Scale/volume: Single wafer up to 100mm diameter
Specifications/resolution: Si-MOS compatible materials only; 450-1100C; UHP N2 purge