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HHV sputtering system

HHV sputtering system

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of New South Wales
Purpose: non-directional deposition of a range of metals (multi-target)
Material systems: Most substrates
Node: New South Wales
Scale/volume: Single wafer; 600mm chamber
Specifications/resolution: Five target positions; 600W rf power supply; 2kW DC power supply; heated rotary work holder (290mm diamter, to 400C)