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Edwards sputtering system

Edwards sputtering system

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of New South Wales
Purpose: non-directional deposition of a range of metals (single target)
Material systems: Most substrates
Node: New South Wales
Scale/volume: Single wafers up to 50mm diameter
Specifications/resolution: Single target; Gases available: O2, Ar; 10-300W rf power; 10-300W DC power