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Diffusion Furnace - Boron

Diffusion Furnace (Boron)

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of New South Wales
Purpose: Si p-type dopant diffusion
Material systems: ONLY fully cleaned Silicon wafers
Node: New South Wales
Scale/volume: Multiple (up to 8) wafers up to 50mm diameter
Specifications/resolution: 800-1100C; gases: N2; solid source wafer diffusion (p to p+)