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Anneal Furnace - Clean Anneal

Anneal Furnace (Clean Anneal)

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: University of New South Wales
Purpose: high temperature annealing (Si only)
Material systems: Si MOS compatible materials only
Node: New South Wales
Scale/volume: Multiple (up to 20) wafers up to 100mm diameter
Specifications/resolution: Si-MOS compatible materials only; 350-500C; gases: N2, forming gas (95% N2, 5% H2)