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XPS Auger electron spectroscopy electrical analysis

X-ray photoelectron spectroscopy (XPS) is a quantitative technique that measures the composition and electronic state of the elements are on the surface of a sample. Spectra are obtained by irradiating a sample with a beam of X-rays while measuring the number of electrons of a specific energy that escape from the top 1 to 10 nm of the surface. XPS requires that the sample is exposed to ultra-high vacuum (UHV) conditions. Detection limits for most of the elements are in the range of parts per thousand.

The analyser can also be used to check the uniformity of elemental composition across the top surface (line profiling or mapping) and as a function of depth into the sample (by ion beam etching). A number of additional film preparation tools are available within the same vacuum system.

Fabrication step: Characterisation
Function: Surface - thin films
Location: University of Newcastle
Purpose: Determination of elemental composition and chemical bonding on sample surfaces.
Material systems: Polymers, organics, dielectrics, metals, semiconductors, glasses and ceramics
Node: Materials
Scale/volume: Maximum sample size: 20 x 20 mm
Specifications/resolution: Analyser focus to 100 μm. Base pressure 10-11 mbar. Preparation chamber with sputter gun, e-beam, K-cell and organic evaporators and load lock connection directly to glovebox. Methods available: XPS, UPS, ARXPS, ARUPS, LEED and thin film deposition