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Chemical vapour deposition

Chemical Vapour Deposition (CVD) is most often used to produce thin films and nanostructures. In thermal CVD a heated substrate is exposed to one or more gas-phase precursors, which react and/or decompose at the surface to produce the required film.

This Atomate CVD system consists of a horizontal tube furnace through which precursor gases can be flowed, and is capable of both thermal and RF-plasma enhanced CVD (PECVD). The latter allows for decomposition of a wider variety of precursor molecules that can contribute to the growth of the nanostructures. The system is fully computer controlled and has several recipes already available, including the growth of carbon nanotubes (CNTs), metal and metal oxide nanowires, graphene and ZnO films.

Fabrication step: Micro and nano fabrication
Function: Deposition
Location: University of Newcastle
Purpose: Growth of carbon nanotubes, graphene films, vapour polymerisation and metal-oxide films using metal-organic precursors
Material systems: Polymers, dielectrics, metals and carbon nanostructures
Node: Materials
Scale/volume: 45 x 1000 mm quartz tube and 25 x 50 mm sample size
Specifications/resolution: Quartz tube furnace with 3 heating zones up to 1000°C, 8 controlled gas sources (10 sccm to 2 SLM) plus one liquid bubbler ampoule; controlled tube pressure from 40 mTorr to 760 Torr and upstream RF plasma (200 W) for precursor decomposition