Ion implantation, doping and diffusion
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Ion implantation, doping and diffusion

Incorporating a dopant can allow a material to take on novel features – this could include changing a material’s hardness, reactivity, optical and electrical properties, or any number of other adjustments. To introduce the impurity, the substrate is typically heated, or the new material is propelled into the sample.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
IBS IMC-200
Ion implanter
NSW Node University of New South Wales
Description
ion implanter
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco boron diffusion
Furnace for diffusion of boron
NSW Node University of New South Wales
Description
boron diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco phosphorus diffusion
Furnace for diffusion of phosphorus
NSW Node University of New South Wales
Description
phosphorus diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Ion Implantation Lab
We offer a full range of ion-implantation services Species: Most elements, except inert gases. Energies: Ion energies in the range 15 keV to 10 MeV, depending on species. Temperature: Samples can be heated or cooled during implantation. Area: Wafers up to 150 mm (6”) diameter can be accommodated. Typical implant areas are of order 3cm x 3cm.
ACT Node
Description
.7 MV NEC Tandem (5SDH) high-energy ion-implanter 150 kV ion-implanter with negative ion source 1.7 MV NEC Tandem RBS/ERDA beamline for ion-beam analysis
Tool Contact
iilab@anu.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
IBS IMC-200
Ion implanter
ACT Node
Description
ion implanter
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco boron diffusion
Furnace for diffusion of boron
ACT Node
Description
boron diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco phosphorus diffusion
Furnace for diffusion of phosphorus
ACT Node
Description
phosphorus diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Ion Implantation Lab
We offer a full range of ion-implantation services Species: Most elements, except inert gases. Energies: Ion energies in the range 15 keV to 10 MeV, depending on species. Temperature: Samples can be heated or cooled during implantation. Area: Wafers up to 150 mm (6”) diameter can be accommodated. Typical implant areas are of order 3cm x 3cm.
ACT Node
Description
.7 MV NEC Tandem (5SDH) high-energy ion-implanter 150 kV ion-implanter with negative ion source 1.7 MV NEC Tandem RBS/ERDA beamline for ion-beam analysis
Related Information
Tool Contact
iilab@anu.edu.au