Furnaces

High temperature furnaces used to melt materials to create glass fibre fabrication.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Barrell Melt extrusion pot
Polymer melting pot
Materials Node University of Wollongong
Description
Pneumatic melt pot extruder
Related Information
250g max
Tool Contact
sbeirne@uow.edu.au
Carbolite Gero Tube Furnace
Horizontal furnace
Materials Node University of Wollongong
Description
Horizontal tube furnace
Related Information
More information to come.
Tool Contact
sbeirne@uow.edu.au
Custom Glass melter
Controlled atmosphere oxide glass melting facilities.
Optofab Node University of Adelaide
Description
Facility consisting of a 6-port Heraeus glovebox with integrated furnaces
Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces.
Tool Contact
optofab@adelaide.edu.au
Hitech CTF/150/3Z/1200C
Oxidation Furnace
QLD Node University of Queensland
Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
anff@uq.edu.au
Thermco oxidation furnace
Oxidation furnace for Si only
NSW Node University of New South Wales
Description
clean Si oxidation furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco UDOX
Ultra dry oxidation (UDOX) furnace for Si only
NSW Node University of New South Wales
Description
UDOX ultra-clean Si oxidation furnace (MOS)
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Hitech CTF/150/3Z/1200C
Wet/dry oxidation furnace
Melbourne Centre for Nanofabrication VIC Node
Description
Allows for the wet or dry oxidation of up to 25 wafers in one run. SiO2 growth up to 4µm possible via wet oxidation.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Barrell Melt extrusion pot
Polymer melting pot
Melbourne Centre for Nanofabrication VIC Node
Description
Pneumatic melt pot extruder
Related Information
250g max
Tool Contact
sbeirne@uow.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Carbolite Gero Tube Furnace
Horizontal furnace
Melbourne Centre for Nanofabrication VIC Node
Description
Horizontal tube furnace
Related Information
More information to come.
Tool Contact
sbeirne@uow.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Custom Glass melter
Controlled atmosphere oxide glass melting facilities.
Melbourne Centre for Nanofabrication VIC Node
Description
Facility consisting of a 6-port Heraeus glovebox with integrated furnaces
Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces.
Tool Contact
optofab@adelaide.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Hitech CTF/150/3Z/1200C
Oxidation Furnace
Melbourne Centre for Nanofabrication VIC Node
Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco oxidation furnace
Oxidation furnace for Si only
Melbourne Centre for Nanofabrication VIC Node
Description
clean Si oxidation furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco UDOX
Ultra dry oxidation (UDOX) furnace for Si only
Melbourne Centre for Nanofabrication VIC Node
Description
UDOX ultra-clean Si oxidation furnace (MOS)
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Hitech CTF/150/3Z/1200C
Wet/dry oxidation furnace
Melbourne Centre for Nanofabrication VIC Node
Description
Allows for the wet or dry oxidation of up to 25 wafers in one run. SiO2 growth up to 4µm possible via wet oxidation.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
mcn-enquiries@nanomelbourne.com