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Qualiflow JetFirst 100, rapid thermal annealing system

Thermal annealing processes are commonly used to remove implantation damage, activate species and alloy materials (ohmic contacts of metal on semiconductors). Thanks to the use of halogen lamps it features a very fast heating cycle (typically a few hundreds °C in a few seconds).

The system is foreseen of a rotary pump.

Fabrication step: Micro and nano fabrication
Function: Furnace
Location: Australian National University
Purpose: Alloying metals and materials
Material systems: Si, III-V and glass
Node: Australian Capital Territory
Scale/volume: up to 3 inch wafer
Specifications/resolution: up to 1400C for < 10 minutes