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Ion Implanter

Ion Implanter

Fabrication step: Micro and nano fabrication
Function: Ion Implantation
Location: Australian National University
Purpose: High current ion implantation capability capable of handling large wafers
Material systems: Ions may be produced from virtually all elements
Node: Australian Capital Territory
Scale/volume: Small pieces and wafers up to 200mm
Specifications/resolution: High current R&D system energy range 5 350 kV full wafer capability (up to 200mm) ions may be produced from virtually all elements including elemental or compound gases and vapours