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Field Emission Scanning Electron Microscope FE SEM

Field Emission Scanning Electron Microscope (FEG SEM)

The FEG-SEM is used to characterise the surface topography of a wide variety of samples. A tightly focussed electron beam is scanned onto the surface to be imaged. As the primary electrons hit the atoms in the surface, a number of secondary electrons are emitted, and collected by the instrument’s detector, which accordingly assigns a level of grey, thereby creating a pixel for a digital image.

The machine can routinely image features down to about 10 nm, and in some special cases down to several nm in size.

Fabrication step: Characterisation
Function: Microscopy
Location: Melbourne Centre for Nanofabrication
Purpose: The SEM is a key tool for process characterization in the MCN’s clean room. Virtually every sample fabricated undergoes at least one set of SEM imaging, in order to assess the quality of the fabrication, its defects. This information is fed into the process optimization loop until a satisfying sample is produced. The tool is also used to image samples from outside, for example fixated cells, failed components etc.
Material systems: All materials
Node: Victoria
Scale/volume: Max Wafer Size = 6 inches
Specifications/resolution: FEI NovaNanoSEM-430