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Dual Beam Focused ion beam

Dual-beam Focused Ion Beam-Scanning Electron Microscopy (FIB-SEM) is a very powerful technique combining the imaging capability of an electron microscope with the ability to remove material from a sample surface using a beam of energetic ions. The ion beam can be used to create nano/micro-scale patterns on a sample surface or to cut a cross-section of the sample surface for imaging/analysis of thin film heterostructures beneath the sample surface.

Fabrication step: Characterisation
Function: Microscopy
Location: Melbourne Centre for Nanofabrication
Purpose: FIB-SEM is a very versatile technique with a wide range of applications including advanced materials development/characterization, electronics, mining and forensics.
Material systems: All materials
Node: Victoria
Scale/volume: Max Wafer Size = 6 inches
Specifications/resolution: MCN has a FEI Helios NanoLab 600 DualBeam FIB-SEM which features ultrahigh resolution imaging with resolution down to 3 nm, FIB milling resolution down to 20 nm, rapid, automated 3D profiling and150 mm diameter stage movement.